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Advanced Photography & Encaustic / November 6-9 / Kingston & Woodstock / 4 Day

R&F is excited to collaborate with The Center for Photography in Woodstock, NY to offer this 4 day advanced intense workshop.  This session is intended for artists who are experienced with photography and encaustic, but seek to take things to the next level. Participants will work  intensively within a small group of peers, enhancing their technical knowledge and benefiting from the guidance of two accomplished instructors. The first two days will be spent utilizing the traditional and digital darkroom facilities at CPW, with unlimted access to print, scan and prepare photographic works to be combined with the encaustic process.  The following two days will be spent in the studio at R&F, with access to the complete range of encaustic paints and tools.  This   creative atmosphere will be the perfect place to bring your individual projects to fruition, while fueling exciting discussions, critiques and demonstrations.

Participants will have access to state-of-the-art photographic equipment including large-format printers, scanners and SLR cameras.  Participants can choose to go on location if they are    interested in photographing and printing a body of work.  The workshop will include class critiques and discussion about projects so that participants can bounce ideas off of one another, helping them to find direction for their work.  Fawn Potash and Danielle Correia will be there as moderators, assiting participants with their projects, guiding them through the processes, and allowing for spontaneity and creative expression.

An application for admission into this workshop is required and due by August 31st, 2010. Class size is limited to 7 participants.

Contact The Center for Photography in Woodstock (845) 679-9957 to register.  Registration begins April 14th, 2010. The cost for CPW members is $700* / $730* for non-members / $85 lab fee.